Markwitz, A.; Barry, B.J.; Kennedy, J.V.; Purcell, C.R.; Rudolphi, M.; Trompetter, W.J. 2006 Nanotechnology and ion beam analysis at GNS Science : annual report 2005/06. Lower Hutt, N.Z.: GNS Science. GNS Science report 2006/08 50 p.
Abstract: This report summarises the major science and technical achievements and activities of the Nanotechnology and Ion Beam Analysis team at GNS Science in the financial year 2005/06. Key scientific achievements of the nanotechnology team include high current field emission of GNS's own silicon nanowhiskers and a better understanding of the formation of large silicon carbide (SiC) nanocrystals on silicon. Ion beam analysis was used to research many different samples originating from advanced materials, biology and the environment. Many collaborators in New Zealand have used this ion beam analysis facility to measure trace elements via NRA and PIXE, to map trace element distributions via proton and deuteron microscopy, to obtain elemental depth profiles of minor and major elements with RBS, to measure hydrogen depth profiles with ERD and to probe for trace elements with PIGE. Increased air particulate matter samples from New Zealand and overseas were measured with the GNS’s semi-automatic ion beam analysis facility. The upgraded facility routinely measures major and minor contributions of air pollution sources from motor vehicles, domestic heating, industry, sea spray and wind blown soil etc. Technical upgrades for the 'experimental' ion implanter, the high vacuum electron beam annealer improved the turn-around time and quality of the treatments. A new ion beam sputtering system was commissioned to sputter any solid state material. AFM and Hall-probe systems were commissioned. A new high energy ion implantation beam line was set up at the 6 MV Tandem accelerator at GNS Science and work has started on a new UHV chamber for ion beam analysis. (auth)