The triple beam line : in-situ RBS, EBA and ion implantation

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Lohde, J.; Markwitz, A. 2012 The triple beam line : in-situ RBS, EBA and ion implantation. Lower Hutt, N.Z.: GNS Science. GNS Science report 2011/38 35 p.

Abstract: A new capability of in-situ RBS measurements during ion implantation and electron beam annealing has been developed. This capability is named “Triple beam line” considering the components (1) the RBS beam line, (2) the low-energy ion implanter, and (3) the electron beam annealer. The first section of this report introduces each component. Rutherford Backscattering Spectrometry is briefly discussed. In the middle section of the report, the set-up detailing the three capabilities is presented and discussed allowing a novice operator to operate the components and to reproduce the results. In the final section of the report, modifications to the chamber set-up are discussed including the layout of the triple beam line chamber and first results of in-situ measurements are presented. Results of Pb implanted SiO2 layers are presented highlighting the successful installation of the system. (auth)